Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2004-11-03
2009-12-29
Levin, Naum B (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C700S121000
Reexamination Certificate
active
07640529
ABSTRACT:
A system for generating photomask orders in a specified format includes at least one template or order for entry and storage of photomask order data, wherein the at least one template or order is created based upon requirements of a specified photomask order format. The system includes at least one set of rules corresponding to the at least one template or order, wherein the set of rules includes instructions which insure that a user enter complete information into the at least one template or order as required by the specified order format. The templates or order may be further comprised of components and/or subcomponents which can be stored separately. The data fields in the orders, templates, components, subcomponents, etc. may reference specification grades which can in turn be easily modified to update one or more orders, templates, components, subcomponents, etc. simultaneously.
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Baxter Anthony
Cahalane Daniel J.
Croke Charles E.
Ridgway Nicholas P.
Amster Rothstein & Ebenstein LLP
Levin Naum B
Photronics, Inc.
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