Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-06-13
2006-06-13
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230ER, C156S345430, C156S345440, C156S345450, C156S345460, C156S345470
Reexamination Certificate
active
07059267
ABSTRACT:
A method for grounding a semiconductor substrate pedestal during a portion of a high voltage power bias oscillation cycle to reduce or eliminate the detrimental effects of feature charging during the operation of a plasma reactor.
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Donohoe Kevin G.
Hedberg Chuck E.
Micro)n Technology, Inc.
TraskBritt
Zervigon Rudy
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