Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-12-18
2007-12-18
Lin, Sun James (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
11510147
ABSTRACT:
Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
REFERENCES:
patent: 4757207 (1988-07-01), Chappelow et al.
patent: 5329334 (1994-07-01), Yim et al.
patent: 5877861 (1999-03-01), Ausschnitt et al.
patent: 6573986 (2003-06-01), Smith
patent: 6612159 (2003-09-01), Knutrud
patent: 6664121 (2003-12-01), Grodnemsky et al.
patent: 6694498 (2004-02-01), Conrad et al.
patent: 6732004 (2004-05-01), Mos
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6928628 (2005-08-01), Seligson et al.
patent: 2002/0001083 (2002-01-01), Tabei
patent: 2003/0115556 (2003-06-01), Conrad et al.
patent: 2003/0223630 (2003-12-01), Adel et al.
H.K. Nishihara et al, “Measuring Photolithographic Overlay Accuracy and Correlating Binarized Laplacian of Gaussian Convolutions,” IEEE Trans. On Pattern Analysis and Machine Intelligence, vol. 10, No. 1, Jan. 1988, pp. 17-30.
Starikov A. et al., Accuracy of overlay measurements: tool and mark asymmetry effects, Optical Engineering, Soc. of Photo-Optical Instrumentation Engineers. Bellingham, US, vol. 31, No. 6, Jun. 1992, pp. 1298-1309.
Supplementary European Search Report dated Sep. 22, 2006, received in related European Application No. 03736896.6.
European Search Report dated Jan. 17, 2007, received in related European Application No. 3736896.6.
Adel Michael E.
Ghinovker Mark
Izikson Pavel
Levinski Vladimir
Robinson John
Beyer & Weaver, LLP
KLA-Tencor Technologies Corporation
Lin Sun James
LandOfFree
Use of overlay diagnostics for enhanced automatic process... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Use of overlay diagnostics for enhanced automatic process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Use of overlay diagnostics for enhanced automatic process... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3835761