Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-09-19
2006-09-19
Lin, Sun James (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07111256
ABSTRACT:
Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target. In other embodiments, an overlay and/or stepper analysis procedure is then performed based on the systematic error metric and/or the noise metric, as well as the overlay data.
REFERENCES:
patent: 4757207 (1988-07-01), Chappelow et al.
patent: 5877861 (1999-03-01), Ausschnitt et al.
patent: 6573986 (2003-06-01), Smith et al.
patent: 6612159 (2003-09-01), Knutrud
patent: 6664121 (2003-12-01), Grodnensky et al.
patent: 6694498 (2004-02-01), Conrad et al.
patent: 6732004 (2004-05-01), Mos et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6928628 (2005-08-01), Seligson et al.
patent: 2003/0115556 (2003-06-01), Conrad et al.
patent: 2003/0223630 (2003-12-01), Adel et al.
H.K. Nishihara et al, “Measuring Photolithographic Overlay Accuracy and Correlating Binarized Laplacian of Gaussian Convolutions,” IEEE Trans. On Pattern Analysis and Machine Intelligence, vol. 10, No. 1, Jan. 1988, pp. 17-30
Adel Michael E.
Ghinovker Mark
Izikson Pavel
Levinski Vladimir
Robinson John
Beyer Weaver & Thomas LLP
KLA-Tencor Technologies Corporation
Lin Sun James
LandOfFree
Use of overlay diagnostics for enhanced automatic process... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Use of overlay diagnostics for enhanced automatic process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Use of overlay diagnostics for enhanced automatic process... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3583962