Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch r

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257324, H01L 21465, H01L 2144

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active

059397500

ABSTRACT:
A method for fabricating a first memory cell and a second memory cell electrically isolated from each other. The method including forming a first polysilicon (poly I) layer on an oxide coated substrate and masking the poly I layer to pattern the first memory cell and the second memory cell and an unmasked portion therebetween. The unmasked portion of the poly I layer is transformed into an insulator such that the insulator electrically isolates the poly I layer (e.g., floating gate) of the first memory cell from the poly I layer (e.g., floating gate) of the second memory cell.

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