Use of fluorinated additives in the etching or polishing of...

Details Use of fluorinated additives in the etching or polishing of... Use of fluorinated additives in the etching or polishing of...

2007-12-11

2007-12-11

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

C216S089000, C252S079100, C252S079200, C252S079300, C252S079400

Reexamination Certificate

active

10355072

ABSTRACT:
Use in etching or polishing of integrated circuits of fluorinated additives of formula (I):in-line-formulae description="In-line Formulae" end="lead"?T′(C3F6O)n(CFXO)mT  (I)in-line-formulae description="In-line Formulae" end="tail"?having a number average molecular weight in the range 250–400, in particular of the compound Cl(CF2—CF(CF3)O)nCF2COONa.

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