Use of diffracted light from latent images in photoresist for op

Details Use of diffracted light from latent images in photoresist for op Use of diffracted light from latent images in photoresist for op

1992-03-05

1998-11-03

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430394, G03F 7207

Patent

active

058306110

ABSTRACT:
The present invention includes a method and apparatus for the rapid, nondestructive evaluation of the contrast of a latent image in a photoresist. More particularly, the contrast of the latent image is directly monitored by measuring the intensity of the light diffracted from a pattern in the exposed, undeveloped photoresist known as the latent image. The proper exposure tool parameters, such as exposure tool time and focus, is suitably determined based on the intensity of different orders of diffracted light, namely the 2nd-order diffracted from the latent image. In a preferred embodiment, a test pattern consisting of a periodic pattern, or a pattern of the device associated with the particular lithographic step, is employed to provide well-defined diffraction orders.

REFERENCES:
patent: 3708229 (1973-01-01), Pircher
patent: 4647172 (1987-03-01), Batchelder
patent: 5124216 (1992-06-01), Giapis

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