Use of a Kumakhov lens for X-ray lithography

Details Use of a Kumakhov lens for X-ray lithography Use of a Kumakhov lens for X-ray lithography

1991-04-01

1992-12-29

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, G21K 500

Patent

active

051757559

ABSTRACT:
An X-ray lithography device which utilizes a Kumakhov lens is disclosed. This device is capable of using both small area sources and synchrotron sources. This device provides improved X-ray control, precision and accuracy. Also provided is a method of X-ray lithograph which incorporates a Kumakhov lens.

REFERENCES:
patent: 5016267 (1991-05-01), Wilkins

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