Chemistry: fertilizers – Processes and products – Forms or conditioning
Patent
1991-05-20
1992-10-13
Tsang, Cecilia
Chemistry: fertilizers
Processes and products
Forms or conditioning
544310, C07D23955, A01N 4354
Patent
active
051547554
ABSTRACT:
Disclosed herein is uracil derivatives having a trifluoromethyl group at the 6-position and a phenyl group at the 3-position which has a NHSO.sub.2 D.sup.26 group at 5-position of the benzene ring, halogen atom at 4-position thereof and hydrogen atom or halogen atom at 2-position thereof, which are represented by the formula (I) and showing penetrative translocation activity, a very high herbicidal activity and, particularly, no phytotoxicity against soybean, in which as compared with the conventional herbicidal compounds, the said uracil derivatives can be applied for either soil treatment or soil incorporation treatment, thereby producing a quick and high herbicidal effect even at a very low dosage against a large variety of weeds including perennial weeds, and have the property to residual effect for an appropriate period of time.
REFERENCES:
patent: 4358591 (1982-11-01), Kohn
patent: 4746352 (1988-05-01), Wenger et al.
patent: 4760163 (1988-07-01), Wenger et al.
patent: 4859229 (1989-08-01), Wenger et al.
patent: 4927451 (1990-05-01), Brouwer et al.
patent: 4941909 (1990-07-01), Wenger et al.
patent: 4979982 (1990-12-01), Brouwer et al.
patent: 5017211 (1991-05-01), Wenger et al.
patent: 5041156 (1991-08-01), Suchy et al.
Fukuda Kenzou
Itoh Kaoru
Nawamaki Tsutomu
Satow Jun
Suzuki Koichi
Nissan Chemical Industries Ltd.
Tsang Cecilia
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