Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-03-20
2007-03-20
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000, C526S281000, C526S282000, C549S030000, C549S298000
Reexamination Certificate
active
10497302
ABSTRACT:
There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (V).
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Maeda Katsumi
Nakano Kaichiro
NEC Corporation
Schilling Richard L.
Young & Thompson
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