Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to pre

Details Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to pre Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to pre

1997-12-31

1999-08-31

Brown, Peter Toby

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

148DIG1, 438623, 438624, H01L 2358

Patent

active

059466014

ABSTRACT:
The present invention is a liner and/or barrier layer that will encapsulate the low k materials and act as a diffusion barrier between the low k material and the surrounding metal layers. As the temperatures of the processing sequence increase the liner and/or barrier layer will decrease the diffusion of fluorine from the low k material into the surrounding metal layers. Thus, the present invention will reduce potential corrosion problems of the metal layers.

REFERENCES:
patent: 5453168 (1995-09-01), Nelson et al.
patent: 5661334 (1997-08-01), Akram
patent: 5759906 (1998-06-01), Lou

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