Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1997-04-24
1999-08-17
Hamilton, Cynthia
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528227, 528228, 528229, 430522, 4302711, G03F 711, C08G 802, C08G 1200
Patent
active
059395109
ABSTRACT:
Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photoresist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.
REFERENCES:
patent: 4197392 (1980-04-01), Moore
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5234990 (1993-08-01), Flaim et al.
patent: 5294680 (1994-03-01), Knors et al.
patent: 5478692 (1995-12-01), Doi et al.
patent: 5498514 (1996-03-01), Nakao et al.
patent: 5599653 (1997-02-01), Nakao et al.
Gurevich et al., 100: 140880, English Abstract of SU 1052529 A1, Chemical Abstracts, ASC, 1998.
Gurevich et al. 84-176028 English Abstract of SU 1052529 A Dated Nov. 7, 1983, WPIDS, Derevent Limited, 1998.
RN 90-94-8, Registry, ACS, 1998.
RN 108231-46-5, Registry, ACS, 1998.
Daehre et al., Plaste und Kautschuk, 33, Jahrgang Heft Nov. 1986, pp. 431-436, 1986.
Daehre et al., 106: 196890, Chemical Abstracts online, ACS, 1998.
Patent Abstracts of Japan, vol. 010, No. 075 (E-390).
Iguchi Etsuko
Ishikawa Kiyoshi
Kaneko Fumitake
Oomori Katsumi
Sato Mitsuru
Hamilton Cynthia
Tokyo Ohka Kogya Co., Ltd.
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