Ultraviolet light monitoring system

Details Ultraviolet light monitoring system Ultraviolet light monitoring system

2008-07-17

2010-06-08

Porta, David P (Department: 2884)

Radiant energy

Invisible radiant energy responsive electric signalling

Ultraviolet light responsive means

Reexamination Certificate

active

07732783

ABSTRACT:
An ultraviolet light monitoring system includes first and second electrodes, an evaluation subject film and a power source. The first and second electrodes are opposingly disposed and attract holes which are generated in accordance with irradiation of ultraviolet light. The evaluation subject film is formed in a vicinity of the first and second electrodes, and is a subject of evaluation of damage caused by the irradiation of ultraviolet light. The power source, at times of monitoring of the ultraviolet light, applies a predetermined bias to a series path formed by the first electrode, a gap between the first and second electrodes, and the second electrode.

REFERENCES:
patent: 2005/0263247 (2005-12-01), Samukawa et al.
patent: 2003-282546 (2003-10-01), None
patent: 2005-236199 (2005-09-01), None
Yasushi Ishikawa et al. “Prediction of ultraviolet-induced damage during plasma processes in dielectric films using on-wafer monitoring techniques”, Journal of Vacuum Science Technology A, vol. 23, No. 6, pp. 1509-1512, Nov./Dec. 2005.
Mitsuru Okigawa et al., “On-wafer monitoring of plasma-induced electrical current in silicon dioxide to predict plasma radiation damage”, Journal of Vacuum Science & Technology B, vol. 23, No. 1, pp. 173-177, Jan./Feb. 2005.
Mitsuru Okigawa et al., “Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes”, Journal of Vacuum Science & Technology B, vol. 22, No. 6, pp. 2818-2822, Nov./Dec. 2004.

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