Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-06-22
2000-10-24
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302841, 522100, G03F 7038
Patent
active
061365068
ABSTRACT:
An ultraviolet-curable and alkali-developing type photo solder resist ink comprises an epoxy resin obtained by extending chains of an epoxy compound by an isocyanate compound having at least two isocyanate groups per one molecule of the isocyanate compound, an ultraviolet-curable resin having carboxyl group and an ethylenically unsaturated group having a photopolymerization capability, a photopolymerization initiator, and a diluent. The resist ink shows a wide precuring acceptable width for providing an extended shelf life, a good tacky-dry property after a precuring step, excellent light-sensitivity at an exposing step, superior resolution, and improved removability of a film of the resist ink by an alkaline solution at a developing step. In addition, a solder resist obtained by a post-baking step of the resist ink film provides excellent resistances to molten solder and gold plating.
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patent: 4943516 (1990-07-01), Kamayachi et al.
patent: 5009982 (1991-04-01), Kamayachi et al.
GOO Chem, 1997-498375, Derwent Information Ltd, English Abstract of JP 09-235348A issued Sep. 9, 1997.
English translation of Jp. 05-179185A, Suichii et al. issued Jul. 1993, Translation b Schreiber Translations, Inc for PTO, Apr. 1997.
Hashimoto Soichi
Mizushima Masahiro
Oda Toshikazu
Yoshioka Koichi
Goo Chemical Co., Ltd.
Hamilton Cynthia
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