Ultrathin SOI transistor and method of making the same

Details Ultrathin SOI transistor and method of making the same Ultrathin SOI transistor and method of making the same

2007-07-24

2007-07-24

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having schottky gate

C438S321000, C438S926000, C438S508000

Reexamination Certificate

active

11050495

ABSTRACT:
A method of fabricating an ultrathin SOI memory transistor includes preparing a substrate, including forming an ultrathin SOI layer of the substrate; adjusting the threshold voltage of the SOI layer; depositing a layer of silicon oxide on the SOI layer; patterning and etching the silicon oxide layer to form a sacrificial oxide gate in a gate region; depositing a layer of silicon nitride and forming the silicon nitride into a silicon nitride sidewall for the sacrificial oxide gate; depositing and smoothing a layer of amorphous silicon; selectively etching the sacrificial gate oxide; growing a layer of oxide in the gate region; depositing and smoothing a second layer of amorphous silicon; patterning and etching the second layer of amorphous silicon; implanting ion to form a source region and a drain region; annealing the structure; and depositing a layer of passivation oxide.

REFERENCES:
patent: 5962872 (1999-10-01), Zhang et al.
patent: 6352899 (2002-03-01), Sakiyama et al.
patent: 6677612 (2004-01-01), Akram
patent: 6709913 (2004-03-01), Hsu
patent: 2004/0259297 (2004-12-01), Inumiya et al.

Affiliated with

Also associated with

Rating

Ultrathin SOI transistor and method of making the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultrathin SOI transistor and method of making the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultrathin SOI transistor and method of making the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3773753