Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-05-31
1996-05-28
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419217, 20429809, 20429815, 20429829, C23C 1434
Patent
active
055207847
ABSTRACT:
A method and apparatus for sputter depositing aluminum onto a semiconductor substrate to fill micron and submicron vias utilizes ultrasonic energy to ensure adequate filling of the vias. The semiconductor is supported on a block and heated and subjected to ultrasonic energy greater than 25 kHz as aluminum is sputter deposited onto the substrate surface. The frequency of the ultrasonic energy is varied from 35 to 42 kHz as the aluminum is deposited in order to avoid standing wave or node formation along the substrate surface. This permits for an efficient high quality application of aluminum and filling of vias on a semiconductor substrate.
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Materials Research Corporation
Nguyen Nam
Sony Corporation
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