Ultra thin photolithographically imageable organic black matrix

Details Ultra thin photolithographically imageable organic black matrix Ultra thin photolithographically imageable organic black matrix

1996-09-27

1998-07-14

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430 7, G03F 7004

Patent

active

057802017

ABSTRACT:
An organic black matrix having high resistivity (.gtoreq.10.sup.11 ohm/square), high optical density (.gtoreq.2.0) at ultra thin film thicknesses (.ltoreq.1.0 microns) for improved STN and TFT pixel display applications is made possible by combining polyimide/dye solutions and mixed metal oxide pigment dispersions at a weight/weight ratio of dye to pigment of 1:15 to 3:15. The need for low resistivity carbon black, as a replacement for sputtered chrome, is negated.

REFERENCES:
patent: 4822718 (1989-04-01), Latham et al.
patent: 5527649 (1996-06-01), Sato et al.
patent: 5619357 (1997-04-01), Angelopoulos et al.

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