UHV compatible lift-off method for patterning nobel metal silici

Details UHV compatible lift-off method for patterning nobel metal silici UHV compatible lift-off method for patterning nobel metal silici

1988-02-08

1990-02-20

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156651, 156653, 156656, 156657, 1566591, 20419237, 4272554, 437201, 437228, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

049023799

ABSTRACT:
A method for making a pattern of a nobel metal silicide selectively forming the silicide under UHV conditions and then removes unreacted metal, by using a UHV-compatible lift-off process.

REFERENCES:
patent: 4109372 (1978-08-01), Geffken
patent: 4180596 (1979-12-01), Crowder et al.
patent: 4398341 (1983-08-01), Geipel et al.
patent: 4528744 (1985-07-01), Shibata
patent: 4640738 (1987-02-01), Fredericks et al.

Affiliated with

Also associated with

Rating

UHV compatible lift-off method for patterning nobel metal silici does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with UHV compatible lift-off method for patterning nobel metal silici, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and UHV compatible lift-off method for patterning nobel metal silici will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1614383