Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-03-03
1998-12-01
Warden, Jill
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 221, 134 21, 438905, B08B 700
Patent
active
058432396
ABSTRACT:
A method for removing particles from an interior surface of a processing chamber using a two-step cleaning process. The method includes introducing a first cleaning process gas into the processing chamber, applying energy to that first cleaning process gas to remove particles from the processing chamber's interior surface, and introducing a second cleaning process gas into the processing chamber to remove a cleaning residue formed by a reaction between the first cleaning process gas and the processing chamber's interior surface. Removing or gettering the cleaning residue from the chamber wall improves the quality of the wafers formed in the process.
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Applied Materials Inc.
Chaudhry Saeed
Warden Jill
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