Two position anneal chamber

Details Two position anneal chamber Two position anneal chamber

2007-12-25

2007-12-25

Vu, David (Department: 2818)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S269000

Reexamination Certificate

active

10823849

ABSTRACT:
Embodiments of the invention generally provide an annealing apparatus and method for a semiconductor processing platform. The annealing apparatus includes a plurality of isolated annealing chambers, wherein each of the annealing chambers has a heating plate positioned in a sealed processing volume, a cooling plate positioned in the processing volume, and a substrate transfer mechanism positioned in the processing volume and configured to transfer substrates between the heating plate and the cooling plate. The annealing system further includes a gas supply source selectively in communication with each of the individual annealing chambers.

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