Two layer resist system

Details Two layer resist system Two layer resist system

1977-12-30

1979-12-25

Hoffman, James R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

427 96, 427407R, 430296, 430325, B05D 136, G03C 174

Patent

active

041806042

ABSTRACT:
A resist mask comprising two layers of resist, one of which is saturated with a dilutant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. The second layer is said saturated resist and the first layer is non-saturated. This composite is preferaly used to form a relief mask with recessed sidewalls used in lift-off processes.

REFERENCES:
patent: 3506441 (1970-04-01), Gottfried
patent: 3669661 (1972-06-01), Page et al.
patent: 3745094 (1973-07-01), Greene
patent: 3799777 (1974-03-01), O'Keeffe et al.
patent: 3867148 (1975-02-01), O'Keeffe et al.
patent: 3873313 (1975-03-01), Horst et al.
patent: 3904492 (1975-09-01), Rich et al.
patent: 3934057 (1976-01-01), Moreau et al.
patent: 3988153 (1976-10-01), Politycki
patent: 4004044 (1977-01-01), Franco et al.
patent: 4007047 (1977-02-01), Kaplan et al.
patent: 4024293 (1977-05-01), Hatzikis

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