Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-03-14
1986-09-16
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430296, 430311, 430312, 430325, 430331, G03C 500
Patent
active
046122702
ABSTRACT:
The erosion rate of a layer of negative-working resist is markedly reduced by forming thereon a thin layer of polyfunctional acrylate or methylacrylate monomer. Upon irradiation, the monomer insolubilizes at a faster rate than the resist thereby forming a crust thereon. The result is reduced erosion, improved edge acuity and fewer pinholes in the developed resist pattern.
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Watts, Solid State Technology, Feb. 1984, pp. 111-113.
Takahashi, Semiconductor International, Dec., 1984, pp. 91-97.
Thompson et al., J. Electrochemical Science and Technology, vol. 126, No. 10, pp. 1703-1708, 1979.
Holder Paula M.
Pampalone Thomas R.
Dees Jos,e G.
Kittle John E.
Morris B. E.
RCA Corporation
Swope R. Hain
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