Two-dimensional to three-dimensional VLSI design

Details Two-dimensional to three-dimensional VLSI design Two-dimensional to three-dimensional VLSI design

1998-07-10

2000-06-06

Lintz, Paul R.

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

716 3, 257618, G06F 1750

Patent

active

060713151

ABSTRACT:
An apparatus and a method for producing a mask, which was derived using two-dimensional design tools, for imparting circuit designs directly on a three-dimensional surface. The method for creating the mask includes the steps of creating a two dimensional design with at least one element, establishing a location coordinate for the element using a two-dimensional coordinate system, converting the location coordinate for the element into a spacial coordinate for the element using a three-dimensional spacial coordinate system, converting the spacial coordinate for the element into a positional coordinate, and generating the mask using the positional coordinate. The apparatus for implementing three-dimensional designs using a mask, which is generated from a two-dimensional design, includes a light source and an elliptical mirror. The elliptical mirror has two focal points so that the elliptical mirror can focus a beam of light onto the three-dimensional surface.

REFERENCES:
patent: 5472828 (1995-12-01), Akins et al.

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