Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-05-02
2009-12-08
Vu, David (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE29309, C257SE21423, C438S287000, C438S954000, C365S184000
Reexamination Certificate
active
07629640
ABSTRACT:
Charge migration in a SONOS memory cell is eliminated by physically separating nitride layer storage sites with dielectric material. Increased storage in a cell is realized with a double gate structure for controlling bit storage in line channels between a source and a drain, such as with a FinFET structure in which the gates are folded over the channels on sides of a fin.
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Eitan et al, “NROM: A Novel Localized Trapping , 2-Bit Nonvolatile Memory Cell”, IEEE Electron Device Letters, vol. 21, No. 11, Nov. 2000, pp. 543-545.
Huang et al., “Sub-50 nm P-Channel FinFET”, IEEE Transaction on Electron Devices, vol. 48, No. 5, May 2001, pp. 880-886.
King Tsu-Jae
She Min
Ho Hoang-Quan T
O'Banion John P.
The Regents of the University of California
Vu David
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