Tuning a substrate temperature measurement system

Thermal measuring and testing – Thermal calibration system

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

374124, 374141, 702130, 356 43, G01K 1500

Patent

active

061648167

ABSTRACT:
A technique and system for tuning temperature sensor readings in a thermal processing chamber includes determining an actual temperature profile for a substrate based on measurements of the substrate. A simulated temperature profile for the substrate is calculated using a respective interim temperature correction value for one or more temperature sensors associated with the chamber. A Gaussian-like distribution for thermal contributions from multiple radiation sources in the chamber can be used to simulate the temperature profile. The simulated temperature profile and the actual temperature profile are combined to form an estimated temperature profile. A final value for each respective temperature correction value is determined using an optimization algorithm which results in the estimated temperature profile being substantially uniform across the surface of the substrate. Each final temperature correction value is used as an offset to temperature measurements obtained from the corresponding temperature sensors.

REFERENCES:
patent: 3796099 (1974-03-01), Shimotsuma et al.
patent: 4408878 (1983-10-01), Fischbach
patent: 4611930 (1986-09-01), Stein
patent: 4659234 (1987-04-01), Brouwer et al.
patent: 4708474 (1987-11-01), Suarez-Gonzalez
patent: 4881823 (1989-11-01), Tanaka et al.
patent: 4919542 (1990-04-01), Nulman et al.
patent: 4956538 (1990-09-01), Moslehi
patent: 4975827 (1990-12-01), Yonezawa
patent: 4979134 (1990-12-01), Arima et al.
patent: 5011295 (1991-04-01), Krishnan et al.
patent: 5029117 (1991-07-01), Patton
patent: 5226732 (1993-07-01), Nakos et al.
patent: 5326171 (1994-07-01), Thompson et al.
patent: 5444815 (1995-08-01), Lee et al.
patent: 5446825 (1995-08-01), Moslehi et al.
patent: 5561612 (1996-10-01), Thakur
patent: 5660472 (1997-08-01), Peuse et al.
patent: 5712467 (1998-01-01), Straka et al.
patent: 5755511 (1998-05-01), Peuse et al.
Pikashov et al., Determining Emissivity and True Surface Temperature By Means Of A Pyrometer And An Attachment, Gas Institute, Kiev., translated from inzhenerno-Fizicheskii Zhurnal, 16, 723-730 (1969).
Roozeboom, F., "Rapid Thermal Processing: Status, Problems and Options After the First 25 Years", Materials Research Society Symposium Proceedings (1993) vol. 303, pp. 149-164 Apr., 1993.
Roozeboom, F., "Manufacturing Equipment Issues in Rapid Thermal Processing", Rapid Thermal Processing Science and Technology, pp. 349-423 (1993).
Sorrell et al., "Temperature Uniformity in RTP Furnaces", IEEE Transactions on Electron Devices, Jan. 1992, vol. 39, No. 1, pp. 75-80.
Norman, S., "Optimization of Transient Temperature Uniformity in RTP Systems", IEEE Transactions on Electron Devices, Jan. 1992, vol. 39, No. 1, pp. 205-207.
Gyurcsik et al., "A Model for Rapid Thermal Processing: Achieving Uniformity Through Lamp Control", IEEE Transactions on Semiconductor Manufacturing, Feb. 1991, vol. 4, No. 1, pp. 9-13.
Dilhac et al., "Temperature Control in a Rapid Thermal Processor", IEEE Transactions on Electron Devices, Jan. 1992, vol. 39, No. 1, pp. 201-203.
Apte and Saraswat, Rapid Thermal Processing Uniformity Using Multivariable Control of a Circularly Symmetric 3 Zone Lamp, IEEE Transactions on Semiconductor Manufacturing, Aug. 1992, vol. 5, No. 3, pp. 180-188.
Deardorff, D., "Elimination of reflection errors in emissometers by using alternate apertures", Review of Scientific Instruments, Oct. 1976, Vo. 47, No. 10, pp. 1279-1282.
A. Gouffe, Revue D'optique 14, 1-10 (1945) with translation.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Tuning a substrate temperature measurement system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Tuning a substrate temperature measurement system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tuning a substrate temperature measurement system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-987777

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.