Tunable composition and method for chemical-mechanical...

Abrasive tool making process – material – or composition – With inorganic material

Reexamination Certificate

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C051S309000, C106S003000, C106S011000, C438S692000, C438S693000, C252S079100, C252S079400

Reexamination Certificate

active

07153335

ABSTRACT:
A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abrasive and an N-acyl-N-hydrocarbonoxyalkyl aspartic acid compound and/or a tolyltriazole derivative.

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