Trilayered beam MEMS device and related methods

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Physical deformation

Reexamination Certificate

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C257S414000, C200S181000

Reexamination Certificate

active

06917086

ABSTRACT:
Trilayered Beam MEMS Device and Related Methods. According to one embodiment, a method for fabricating a trilayered beam is provided. The method can include depositing a sacrificial layer on a substrate and depositing a first conductive layer on the sacrificial layer. The method can also include forming a first conductive microstructure by removing a portion of the first conductive layer. Furthermore, the method can include depositing a structural layer on the first conductive microstructure, the sacrificial layer, and the substrate and forming a via through the structural layer to the first conductive microstructure. Still furthermore, the method can include the following: depositing a second conductive layer on the structural layer and in the via; forming a second conductive microstructure by removing a portion of the second conductive layer, wherein the second conductive microstructure electrically communicates with the first conductive microstructure through the via; and removing a sufficient amount of the sacrificial layer so as to separate the first conductive microstructure from the substrate, wherein the structural layer is supported by the substrate at a first end and is freely suspended above the substrate at an opposing second end.

REFERENCES:
patent: 5970315 (1999-10-01), Carley et al.
patent: 6040611 (2000-03-01), De Los Santos et al.
patent: 6396368 (2002-05-01), Chow et al.
patent: 6410361 (2002-06-01), Dhuler et al.
patent: 6495387 (2002-12-01), French
patent: 6555201 (2003-04-01), Dhuler et al.
patent: 6555404 (2003-04-01), Kubena et al.
patent: 6583347 (2003-06-01), Tamura
patent: 6630367 (2003-10-01), Kubena et al.
patent: 6746891 (2004-06-01), Cunningham et al.
patent: 2002/0023999 (2002-02-01), Hsu et al.
patent: 2002/0055260 (2002-05-01), Chow et al.
patent: 2002/0131228 (2002-09-01), Potter
patent: 2003/0207487 (2003-11-01), Kubena et al.

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