Trenched MOSFET with guard ring and channel stop

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S331000, C257S341000, C257S409000, C438S270000

Reexamination Certificate

active

08030702

ABSTRACT:
A trenched MOSFET (Metal-Oxide-Semiconductor Field Effect Transistor) with a guard ring and a channel stop, including: a substrate including an epi layer region on the top thereof; a plurality of source and body regions formed in the epi layer; a metal layer including a plurality of metal layer regions which are connected to respective source and body, and gate regions forming metal connections of the MOSFET; a plurality of metal contact plugs connected to respective metal layer regions; a plurality of gate structure filled with polysilicon to form a plurality of trenched gates on top of epi layer; an insulating layer deposited on the epi layer formed underneath the metal layer with a plurality of metal contact holes therein for contacting respective source and body regions; a guard ring wrapping around the metal layer corresponding to the gate region at the termination; and a channel stop which is a heavier N-type doping region aside the guard ring at the termination; Wherein the contact plugs connecting to the top metal layer are corresponding to the source and the body regions.

REFERENCES:
patent: 6049108 (2000-04-01), Williams et al.
patent: 6351018 (2002-02-01), Sapp

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