Trench MOSFET with embedded junction barrier Schottky diode

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S301000, C257S330000, C257SE21085

Reexamination Certificate

active

07863685

ABSTRACT:
A trenched semiconductor power device that includes a plurality of trenched gates surrounded by source regions near a top surface of a semiconductor substrate encompassed in body regions. Each of the body regions extended between two adjacent trenched gates further having a gap exposing a top surface above an epitaxial layer above said semiconductor substrate. The trenched semiconductor power device further includes a Schottky junction barrier layer covering the top surface above the epitaxial layer between the trenched gate thus forming embedded Schottky diodes between adjacent trenched gates.

REFERENCES:
patent: 2007/0290234 (2007-12-01), Wu
patent: 2008/0265289 (2008-10-01), Bhalla et al.

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