Trench etching process

Details Trench etching process Trench etching process

1990-01-08

1991-07-09

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 156653, 156657, 1566591, 156662, 156663, 20419237, 20419233, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

050303163

ABSTRACT:
A trench etching process comprises the steps of: preparing a substrate, forming a mask pattern for the trench etching having a material different from that of the substrate, on the substrate, and detecting changes in results of emission spectroanalyses generated by etching the mask pattern and the substrate while using the etching ratios of the mask pattern and the silicon substrate to determine that the trench etching is completed.

REFERENCES:
patent: 4496425 (1985-01-01), Kuyel

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