Trench etch process for dielectric isolation

Details Trench etch process for dielectric isolation Trench etch process for dielectric isolation

1983-12-29

1985-08-13

Kimlin, Edward

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156653, 156657, 1566611, 156662, 204192E, 427 93, 4272553, H01L 2120, C23C 1304

Patent

active

045348260

ABSTRACT:
A process for etching deep trenches to achieve dielectric isolation for integrated circuit devices; the process insures obtaining substantially perfectly vertical trench walls by precluding significant variation in etch bias during the trench formation.

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