Treatment of planarizing layer in multilayer electron beam resis

Details Treatment of planarizing layer in multilayer electron beam resis Treatment of planarizing layer in multilayer electron beam resis

1987-05-12

1989-03-07

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430271, 430942, 4284735, 428446, 428451, G03C 176

Patent

active

048106178

ABSTRACT:
An improved electron beam resist structure comprises an organic planarizing layer which has been treated with an ion beam for a time sufficient to render it conductive and an electron beam resist layer thereover. The electron beam resist layer is preferably oxygen plasma resistant. When the resist layer is not resistant to oxygen plasma and it is desired to develop the planarizing layer by oxygen plasma, the structure additionally includes a thin hard mask layer, suitably of silicon dioxide, interposed between the conductive planarizing layer and the resist layer.

REFERENCES:
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 4065307 (1977-12-01), Goffe
patent: 4068018 (1978-01-01), Hashimoto et al.
patent: 4396702 (1983-08-01), Desai et al.
patent: 4456677 (1984-06-01), Chin
patent: 4511445 (1985-04-01), Forrest et al.
E. C. Fredericks, "Adhesion and Release Layer for Resist Structures", IBM Technical Disclosure Bulletin, vol. 20, No. 3, Aug. 1977, p. 992.
E. Ong and E. L. Hu, "Multilayer Resists for Fine Line Optical Lithography", Solid State Technology, Jun. 1984, pp. 155-160.
J. B. Kruger, P. Rissman and M. S. Chang, Journal of Vacuum Science Technology, vol. 19, No. 4, Nov., Dec., 1981, pp. 1320-1324.

Affiliated with

Also associated with

Rating

Treatment of planarizing layer in multilayer electron beam resis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Treatment of planarizing layer in multilayer electron beam resis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Treatment of planarizing layer in multilayer electron beam resis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1668205