Treating method

Details Treating method Treating method

1989-03-21

1990-04-03

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419233, 20429803, 20429809, 20429832, 156626, 156643, 427 8, 4272481, C23C 1434, C23C 1600, C03C 1500

Patent

active

049137905

ABSTRACT:
A workpiece treating method includes a temperature rise step in which first temperature control is performed and a treatment step in which second temperature control is performed and is adapted to treat a workpiece whose emissivity of infrared rays in the temperature rise step is different from that in the treatment step. In the temperature rise step, the temperature of the workpiece is detected by a non-contact type temperature detecting means so as to perform the first temperature control. In the treatment step, the temperature of the workpiece is detected by a contact type temperature detecting means so as to perform the second temperature control.

REFERENCES:
patent: 3573190 (1971-03-01), Bloom
patent: 4172020 (1979-10-01), Tisone et al.
patent: 4324631 (1982-04-01), Meckel et al.
patent: 4396478 (1983-08-01), Aizenshtein et al.
patent: 4407708 (1983-10-01), Landau
patent: 4565601 (1986-01-01), Kakehi et al.
patent: 4648952 (1987-03-01), Savov et al.
patent: 4687544 (1987-08-01), Bersin

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