Trapping device, processing system, and method removing...

Details Trapping device, processing system, and method removing... Trapping device, processing system, and method removing...

2004-06-22

2009-02-10

Hopkins, Robert A (Department: 1797)

Gas separation: processes

Heat exchanging

C055S467100, C055SDIG015, C062S055500

Reexamination Certificate

active

07488374

ABSTRACT:
A trapping device is disclosed which is arranged in a vacuum exhaust system (6) for removing gaseous impurities contained in the exhaust gas flowing through the vacuum exhaust system (6) which has a vacuum pump (36) for vacuum exhausting a processing unit (10) wherein a certain process is conducted on a semiconductor wafer. The trapping device comprises an impurity collecting chamber (50) arranged along the exhaust passage in the vacuum exhaust system (6) and a nozzle means (64) which injects a working fluid that is in a supersonic state due to adiabatic expansion for mixing the fluid with the exhaust gas and lowering the temperature of the exhaust gas to or below the critical points of the impurities within the impurity collecting chamber (50).

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patent: 2001-214272 (2001-08-01), None
patent: 2002-503042 (2002-01-01), None

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