Transverse electric-field type liquid crystal display...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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Details

C430S321000, C430S394000, C430S396000, C438S030000

Reexamination Certificate

active

07125654

ABSTRACT:
A process of manufacturing a liquid crystal display device of transverse electric-field type, where a halftone photomask has a fully light-shielding area preventing UV irradiation of a portion of an active matrix substrate in which a thin-film transistor element is to be formed, so that the photoresist pattern includes a positive resist portion which is formed on the portion of the substrate. The halftone mask further has a fully light-transmitting area which permits full UV transmission therethrough to provide the photoresist pattern with a resist-free area which corresponds to a portion of the substrate in which a contact hole serving as a third connection portion connecting an external scanning-line driver circuit and a scanning-line terminal portion through a junction electrode is to be formed. Also disclosed is a scan-exposing device used in the manufacturing process.

REFERENCES:
patent: 6255130 (2001-07-01), Kim
patent: 6451635 (2002-09-01), Park et al.
patent: 6744486 (2004-06-01), Kim et al.
patent: 6876428 (2005-04-01), Kwak et al.
patent: 2002/0028411 (2002-03-01), Park et al.
patent: 2000-66240 (2000-03-01), None
patent: 3126645 (2000-11-01), None

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