Transport pod with protection by the thermophoresis effect

Details Transport pod with protection by the thermophoresis effect Transport pod with protection by the thermophoresis effect

2005-04-20

2010-06-15

Ackun, Jr., Jacob K (Department: 3728)

Special receptacle or package

For plate or sheet

Fragile or sensitive

C206S710000, C414S935000

Reexamination Certificate

active

07735648

ABSTRACT:
A transport pod (1) of the invention for a mask or a semiconductor wafer (2) comprises a leakproof peripheral wall (3) surrounding an inside space (4) receiving the mask or the semiconductor wafer (2). Thermally conductive support means (11) hold the mask or the semiconductor wafer (2). A cold plate (7) thermally coupled to a cold source (8) generates a temperature gradient facing the main face (6) of the mask or the semiconductor wafer (2) that is to be protected against particulate pollution. The cold plate (7) is held by connection means (7b) including thermal insulation means (7c). An on-board energy source (9) powers the cold source (8). This significantly reduces deposition of polluting particles on the main face (6) of the mask or the semiconductor wafer (2).

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Filed Apr. 20, 2005, entitled “Apparatus for Transporting Substrates Under a Controlled Atmosphere” by Roland Bernard.
U.S. Appl. No. 11/109,853 filed Apr. 20, 2005, entitled “Apparatus for Transporting Substrates Under a Controlled Atmosphere” by Roland Bernard et al.

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