Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-10-10
2000-06-06
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430326, 430906, 430908, G03F 7004
Patent
active
060716703
ABSTRACT:
A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being acid-decomposable or hydrolyzable, and a photo-acid-generating agent.
REFERENCES:
patent: 5609989 (1997-03-01), Bantu et al.
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5879857 (1999-03-01), Chandross et al.
patent: 5928841 (1999-07-01), Ushirogouchi et al.
patent: 5932391 (1998-12-01), Ushirogouchi et al.
Koji Nozaki, et al., "A Novel Polymer for a 193-nm Resist", Journal of Photopolymer Science and Technology, vol. 9, No. 3, 1996, pp. 509-522.
Asakawa Koji
Hayase Rumiko
Kawamonzen Yoshiaki
Nakase Makoto
Okino Takeshi
Ashton Rosemary
Baxter Janet
Kabushiki Kaisha Toshiba
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