Transmission mask for charged particle beam exposure apparatuses

Details Transmission mask for charged particle beam exposure apparatuses Transmission mask for charged particle beam exposure apparatuses

1996-10-30

1998-09-29

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 2504923, G03F 900

Patent

active

058144234

ABSTRACT:
A transmission mask for a charged particle beam exposure apparatus that includes a mask substrate having a plurality of apertures arrange in a matrix and a pair of deflection electrodes at each aperture on one surface of the mask substrate. A beam shield layer having a reflectivity to the charged particle beam greater than the mask substrate is positioned on the other surface of the mask substrate. The transmission mask is installed in the apparatus so that the beam shield layer is oriented towards the charged particle beam to prevent an increase in temperature due to irradiation of the charged particle beam.

REFERENCES:
patent: 5254417 (1993-10-01), Wada
patent: 5376802 (1994-12-01), Sakamoto et al.

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