Translation generation for a mask pattern

Details Translation generation for a mask pattern Translation generation for a mask pattern

2007-01-30

2007-01-30

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

11035928

ABSTRACT:
Generation of one or more translations is described. The generated translations may be applied to a mask pattern so that the pattern may be moved to cover one or more mask defects in part or in totality.

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patent: 2004/0126670 (2004-07-01), Liang et al.
patent: 2004/0151988 (2004-08-01), Silverman

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