Transition and inner transition metal chelate polymers for high

Details Transition and inner transition metal chelate polymers for high Transition and inner transition metal chelate polymers for high

1985-03-14

1987-09-15

Briggs, Sr., Wilbert J.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

528 9, 528271, 528395, G03C 500, C08G 7900

Patent

active

046939571

ABSTRACT:
New transition and inner transition metal chelate polymers and method for nthesizing thereof. Such polymers are used as positive or negative resists of high sensitivity for lithographic purposes in integrated circuit chip fabrication requiring submicron resolution. The polymers when irradiated undergo scission or crosslinking events which affects their solubility in developer solvents. They are synthesized either in non-aqueous solution with subsequent removal of excess solvent or interfacially with almost instantaneous precipitation of the polymer at the interface.

REFERENCES:
patent: 3242102 (1966-03-01), Schmeckenbecher
patent: 3384605 (1968-05-01), Saraceno
patent: 3681265 (1972-08-01), Krueger
patent: 4284744 (1981-08-01), Shaffer

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