Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Having heterojunction
Reexamination Certificate
2007-08-07
2007-08-07
Sarkar, Asok Kumar (Department: 2891)
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Having heterojunction
C257SE21375
Reexamination Certificate
active
11481070
ABSTRACT:
A transistor having minimized parasitics is provided including an emitter having a recessed extrinsic emitter portion atop an intrinsic emitter portion; a base including an intrinsic base portion in electrical contact with the intrinsic emitter portion and an extrinsic base portion in electrical contact with the intrinsic base portion and electrically isolated from the recessed extrinsic emitter portion by a set of emitter/base spacers; and a collector in electrical contact with the intrinsic base portion. The transistor may further include extrinsic base having top surfaces entirely silicided to the emitter/base spacer. Additionally, the transistor may include a base window opening within the transistor's active area. Methods of forming the above-described transistor are also provided.
REFERENCES:
patent: 5962880 (1999-10-01), Oda et al.
patent: 6346453 (2002-02-01), Kovacic et al.
patent: 6753234 (2004-06-01), Naem
patent: 2003/0057458 (2003-03-01), Freeman et al.
Greenberg David R.
Jeng Shwu-Jen
Li, Esq. Todd M. C.
Sarkar Asok Kumar
Scully Scott Murphy & Presser, PC
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