Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-05-01
2007-05-01
Pham, Hoai (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S339000, C257S401000
Reexamination Certificate
active
10704259
ABSTRACT:
A semiconductor component includes a semiconductor body having a substrate of a first conduction type and a first layer of a second conduction type that is located above the substrate. A channel zone of the first conduction type is formed in the first layer. A first terminal zone of the second conduction type is configured adjacent the channel zone. A second terminal zone of the first conduction type is formed in the first layer. Compensation zones of the first conduction type are formed in the first layer.
REFERENCES:
patent: 6081009 (2000-06-01), Neilson
patent: 6326656 (2001-12-01), Tihanyi
patent: 6365932 (2002-04-01), Kouno et al.
patent: 2001/0040266 (2001-11-01), Pozzoni et al.
patent: 2002/0063281 (2002-05-01), Tihanyi
patent: 30 02 797 (1981-07-01), None
patent: 36 09 629 (1986-10-01), None
patent: 37 32 210 (1989-04-01), None
patent: 198 28 191 (1999-07-01), None
patent: 100 52 170.3 (2000-10-01), None
patent: 1 026 754 (2000-08-01), None
Greenberg Laurence A.
Infineon - Technologies AG
Locher Ralph E.
Pham Hoai
Stemer Werner H.
LandOfFree
Transistor having compensation zones enabling a low... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Transistor having compensation zones enabling a low..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Transistor having compensation zones enabling a low... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3728812