Metal fusion bonding – Process – With protecting of work or filler or applying flux
Patent
1996-07-09
1999-05-04
Ramsey, Kenneth J.
Metal fusion bonding
Process
With protecting of work or filler or applying flux
228 36, 228106, B23K 120
Patent
active
058993762
ABSTRACT:
A process of transferring a flux on electrodes of a semiconductor chip, a film carrier, or a substrate, the process comprising: using a transfer apparatus including a transfer baseplate having protrusions corresponding to said electrodes; dipping the tips of the protrusions of the transfer baseplate in a flux bath to cause the flux to stick to the tips; then aligning the protrusions of the transfer baseplate with the electrodes; and transferring the stuck flux onto the electrodes from the tips.
REFERENCES:
patent: 4104102 (1978-08-01), Eagon et al.
patent: 4206542 (1980-06-01), Reavill
patent: 4332341 (1982-06-01), Minetti
patent: 4346516 (1982-08-01), Yokouchi et al.
patent: 4462534 (1984-07-01), Bitaillou et al.
patent: 4871110 (1989-10-01), Fukasawa et al.
patent: 5279045 (1994-01-01), Odashima et al.
patent: 5284287 (1994-02-01), Wilson et al.
patent: 5410807 (1995-05-01), Bross et al.
patent: 5431332 (1995-07-01), Kirby et al.
patent: 5435481 (1995-07-01), Da Costa Alves et al.
patent: 5435482 (1995-07-01), Variot et al.
patent: 5445313 (1995-08-01), Boyd et al.
patent: 5615823 (1997-04-01), Noda et al.
patent: 5657528 (1997-08-01), Sakemi et al.
patent: 5695667 (1997-12-01), Eguchi et al.
IBM Technical Disclosure Bulletin, vol. 34, No. 2, pp. 356-357, Jul. 1991.
Hashino Eiji
Shimokawa Kenji
Tatumi Kouhei
Nippon Steel Corporation
Ramsey Kenneth J.
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