Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-03-28
2006-03-28
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S192120, C118S719000, C156S345310, C156S345320, C414S217000, C414S222070, C414S935000, C427S255500
Reexamination Certificate
active
07018517
ABSTRACT:
A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.
REFERENCES:
patent: 4455177 (1984-06-01), Filippov et al.
patent: 4632624 (1986-12-01), Mirkovich et al.
patent: 4790750 (1988-12-01), Bourel et al.
patent: 5085887 (1992-02-01), Adams et al.
patent: 5421957 (1995-06-01), Carlson et al.
patent: 6019839 (2000-02-01), Achutharaman et al.
patent: 6093252 (2000-07-01), Wengert et al.
patent: 6099697 (2000-08-01), Hausmann
patent: 6286451 (2001-09-01), Ishikawa et al.
patent: 6326597 (2001-12-01), Lubomirsky et al.
patent: 6383330 (2002-05-01), Raaijmakers
patent: 6390019 (2002-05-01), Grimbergen et al.
patent: 0 928 014 (1999-07-01), None
patent: 1 065 701 (2001-01-01), None
Beer Emanuel
Blonigan Wendell T.
Kurita Shinichi
Nguyen Hung T.
Applied Materials Inc.
Dugan & Dugan
McDonald Rodney G.
LandOfFree
Transfer chamber for vacuum processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Transfer chamber for vacuum processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Transfer chamber for vacuum processing system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3576941