Tracking control method and electron beam writing system

Details Tracking control method and electron beam writing system Tracking control method and electron beam writing system

2011-04-12

2011-04-12

Vanore, David A (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With target means

C250S3960ML, C250S3960ML, C250S397000, C250S491100, C250S492100, C250S492220

Reexamination Certificate

active

07923699

ABSTRACT:
Control data for a main deflector is calculated based on position data that specifies the position of a region to be irradiated with the electron beam on the subfield, data on the number of all beam shots on the subfield, data on a time required for all the beam shots, and stage data that specifies the position of the stage. When the number of beam shots on one of the divided subfield sections reaches the obtained number of the beam shots on each of the divided subfield sections, a writing process proceed to a writing operation to be performed on another one of the divided subfield sections based on the direction of the movement of the stage.

REFERENCES:
patent: 7476881 (2009-01-01), Hattori et al.
patent: 7589335 (2009-09-01), Matsukawa et al.
patent: 7698682 (2010-04-01), Anpo et al.
patent: 7741614 (2010-06-01), Inoue
patent: 2007/0023689 (2007-02-01), Iizuka et al.
patent: 2008/0011965 (2008-01-01), Matsukawa et al.
patent: 2008/0046787 (2008-02-01), Anpo et al.
patent: 2009/0057575 (2009-03-01), Oogi et al.
patent: 2009/0084990 (2009-04-01), Nishimura et al.
patent: 2009/0134343 (2009-05-01), Inoue
patent: 2009/0272911 (2009-11-01), Goshima
patent: 2009/0285494 (2009-11-01), Handa et al.
patent: 2010/0030522 (2010-02-01), Tsuchiya et al.
patent: 2010/0173235 (2010-07-01), Kato et al.
patent: 2010/0282956 (2010-11-01), Kimba et al.
patent: 2010/0306721 (2010-12-01), Anpo
patent: 2010/0314560 (2010-12-01), Yabara
patent: 6-196394 (1994-07-01), None

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