Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-02-11
1999-07-06
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430905, 522 31, G03F 726
Patent
active
059195967
ABSTRACT:
Disclosed is an admixture which is curable to form a crack resistant, photosensitive polycyanurate resist. Also disclosed is a structure for its use and process of making. The resist can be tailored to be either positively or negatively sensitive to actinic radiation. Because of its improved thermal and mechanical properties, the cured resist is suitable for use at high temperature, such as in electronic packaging applications.
REFERENCES:
patent: 5215860 (1993-06-01), McCormick et al.
patent: 5605781 (1997-02-01), Gelorme et al.
Fuerniss Stephen Joseph
Gelorme Jeffrey D.
Hedrick Jeffrey C.
Lewis Thomas H.
Markovich Voya Rista
Chu John S.
International Business Machines - Corporation
Morris Daniel P.
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