Total reflection X-ray fluorescence apparatus

Details Total reflection X-ray fluorescence apparatus Total reflection X-ray fluorescence apparatus

1991-12-27

1993-06-15

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Fluorescence

378 44, 378 70, 378 79, 378 84, G01N 23223

Patent

active

052205916

ABSTRACT:
A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting intensity of X-rays coming from the base material.

REFERENCES:
patent: 3418466 (1968-12-01), Herglotz
patent: 4121098 (1978-10-01), Jagoutz et al.
patent: 4169228 (1979-09-01), Briska et al.
patent: 4349738 (1982-09-01), Baecklund
patent: 4642811 (1987-02-01), Georgopoulos
patent: 4649557 (1987-03-01), Hornstra et al.
patent: 4916720 (1990-04-01), Yamamoto et al.
patent: 5062127 (1991-10-01), Sayama et al.
A. Iida, et al., "Grazing Incidence X-Ray Fluorescence Analysis," Nuclear Instruments & Methods in Physics Research, Section A, vol. A-246, Nos. 1/3, pp. 736-738, May 1986.
H. Aiginger, et al., "A Method for Quantitative X-Ray Fluorescence Analysis in the Nanogram Region," Nuclear Instruments and Methods vol. 114, pp. 157-158, 1974.

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