Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Patent
1999-06-03
2000-11-28
Nguyen, Kiet T.
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
250396R, H01J 4920
Patent
active
06153885&
ABSTRACT:
A semiconductor manufacturing tool for charged particle lithography systems such as an EBPS comprises a magnetic deflector with a hub comprising a cylinder mounted on flange. The hub has an opening for a particle beam. Grooves on the surface of the flange at the base of the cylinder and slots in the edge of the cylinder support several deflection coil vanes. Each of the vanes is formed of substrate comprising a thin plate which has a left surface and a right surface. Complementary electrical coils are wound as a planar spirals on the left surface and on the right surface of the vanes with a via connection through the plate interconnecting the coils. The series connected, spiral coils are patterned as mirror images so that the magnetic fields from the coils are additive. To accommodate vanes carrying large currents, the plate is quartz and complementary copper conductor spirals are bonded to the sides of the quartz plate.
REFERENCES:
patent: 4251728 (1981-02-01), Pfeiffer et al.
patent: 4251790 (1981-02-01), Lucas
patent: 5631615 (1997-05-01), Messick et al.
patent: 5994703 (1999-11-01), Arai
patent: 5994704 (1999-11-01), Nakasuji
Jones II Graham S.
Nguyen Kiet T.
Nikon Corporation
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