Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-06-23
2008-12-09
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S311000, C430S325000, C430S326000, C430S327000, C526S245000, C438S952000
Reexamination Certificate
active
07462439
ABSTRACT:
Disclosed herein is a top anti-reflective coating polymer represented by Formula 1, below:wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are partly replaced by fluorine atoms; and a, b and c, representing the mole fraction of each monomer, are in the range between 0.05 and 0.9. Because a top anti-reflective coating formed using the anti-reflective coating polymer of Formula 1 is not soluble in water, it can be applied to immersion lithography using water as a medium for a light source. In addition, because the top anti-reflective coating can reduce the reflectance from an underlying layer, the uniformity of CD is improved, thus enabling the formation of an ultra fine pattern.
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Bok Cheol Kyu
Jung Jae Chang
Lim Chang Moon
Moon Seung Chan
Hamilton Cynthia
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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