Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2008-06-03
2008-06-03
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C525S276000, C525S243000, C525S259000, C430S326000, C430S273100
Reexamination Certificate
active
07381519
ABSTRACT:
Disclosed herein is a top anti-reflective coating polymer and its composition comprising the same represented by Formula 1 below:wherein R1and R2are independently, hydrogen, methyl or fluoromethyl; R3and R4are independently, a C1-10hydrocarbon or a C1-10hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; and a, b, c, d and e represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, d, and e equals one.
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MPCA Glossary, Minnesota Pollution Control Agency, http://www.pca.state.mn.us/gloss/glossary.cfm?alpha=P&header=1&glossaryCat=1, 3 pages prined from web on Jan. 31, 2008.
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Bok Cheol Kyu
Jung Jae Chang
Lim Chang Moon
Moon Seung Chan
Hamilton Cynthia
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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